This year marks the fourth year that Epson has held its Digital Couture Project leading up to New York’s Fashion Week. The event features 13 designer team collections created using Epson’s state-of-the-art dye-sublimation printing. The goal of the collaboration is to showcase the impact of Epson’s dye-sublimation printing technology on design inspiration and workflows, enabling today’s fashion designers to bring their creative visions to fabric in new and versatile ways with advanced digital technologies. It showcases how the design potential and impact of digital printing technologies (in their case, using Epson printers) on the fashion marketplace is limitless.

Featured designers included: Michele Gevaerd (Brazil); Hayley Elsaesser (Toronto); Karyn Coo (Chile); Stephanie Ruiz (Ecuador); Eduardo Figueroa (Guatemala); Emilio Mata (Mexico); Ilse Jara (Paraguay); Lina Cantillo (Colombia); Candice Cuoco (Los Angeles); Fernando Alberto (Miami); and threeASFOUR from New York (Gabriel Asfour, Angela Donhauser, and Adi Gil). Also participating were Alexandra Pizzigoni and Patricia Franklin from Philadelphia’s Thomas Jefferson University.

“We were extremely pleased that more than 2,000 people visited our Digital Couture Project during a very busy series of Fashion Week events,” said Mark Radogna, Strategic Marketing, Epson America. “Epson, more than any other brand, believes that digital printing is the future of printing textiles. Digital printing technology has disrupted every industry it has touched—signage, flexography, commercial print, photography, and packaging, to name a few. I believe the same thing will come true for fashion, and for textile printing in general. This event provides an opportunity for designers to show off their designs, and for Epson to continue educating the community of fashion designers about the benefits of digital fabric printing technology, and what we believe is an exciting change coming their way.”