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RR Donnelley expands research & development center

Press release from the issuing company

Chicago - R. R. Donnelley & Sons Company announced that its expanded research and development facility will open officially on August 1, 2010. The 120,000 sq. ft. facility at 300 Lang Blvd. in Grand Island, NY will feature printed electronics, ink and materials labs as well as a complete pilot plant for development and production of variable digital presses. Inline configurations that combine proprietary digital printing capabilities with book, direct mail, statement processing and other applications will also be developed and tested in the pilot plant.

The facility will also bring other RR Donnelley operations in the upstate New York area under a single roof.

"This facility enhances continuing RR Donnelley initiatives," said Thomas J. Quinlan III, the company's President and Chief Executive Officer. "It reflects our commitment to developing and deploying leading technologies. From innovations in labeling to the introduction of our ProteusJet(R) variable digital printing units, the products arising from our R&D operations are creating exceptional value for our customers. The facility also embodies the deep level of integration that we have achieved as we have successfully brought more than a dozen acquisitions into RR Donnelley in recent years. Bringing people from a variety of disciplines together in one space creates even more opportunities for the collaboration that helps us to create solutions that draw on the full range of our offering."

Mary Lee Schneider, RR Donnelley's Chief Technology Officer noted, "This state-of-the-art facility provides an exceptional environment for developing and commercializing innovations. We listen carefully to our customers as they describe their communications challenges and create new products and services that are responsive to their needs."