Sydney, Australia, March 31, 2006 – LithoTechnics announced today that Metrix will be an essential part of workflow demonstrations shown by various partners at the upcoming Ipex trade show in Birmingham, UK. LithoTechnics is participating in the JDF Pavilion (Hall 20-C60, Pod R), and in that capacity will play a vital role in four JDF nteroperability demonstrations. Metrix will consume JDF from NovaVision's PrintVis MIS system, and from Job Submission systems including Screen's RitePortal SE and ePrint-Direct Skyline. Once Metrix has read the incoming JDF file and automatically generated the appropriate signature layouts, including all trims and marks, Metrix creates a JDF imposition file to pass along to various prepress systems and RIPs, including Kodak's Prinergy, Screen's TrueFlow, and the JDF-enabled Harlequin RIP from Global Graphics. Additionally, Metrix will be featured as an indispensable tool for “bridging the gap” at the stands of three prominent MIS vendors: Optimus (Hall 20-C23), Prism (Hall 20-C40), and Tharstern (Hall 20-C45). Metrix version 2 will be used to dynamically and automatically calculate publication layouts, upon receiving the JDF job description from MIS. Using dynamic layout calculation combined with intelligent template technology, Metrix will add the information required to impose the job based on user preferences. Metrix will also be used to instantly recalculate the signature layouts for another press – illustrating the adaptive planning capabilities built in to Metrix. "We are very pleased to be working with this impressive array of partners at Ipex," says Rohan Holt, founder of LithoTechnics. "We have been very active in the CIP4 Organization along with our Ipex partners, as well as many others. It is very satisfying to see JDF bear fruit, as more and more critical linkages come to life, bringing real productivity gains to printers."