December 16, 2002 -- A series of industrial courses for the color imaging community will be offered June 3-6 at the internationally known Munsell Color Science Laboratory, part of Rochester Institute of Technology’s Chester F. Carlson Center for Imaging Science. The MCSL summer workshops—now in its 20th year—offer introductory and refresher courses on principles of color technology, as well as courses on advanced or specialized topics. Each course features hands-on experience that takes advantage of the MCSL’s unique facilities. Course offerings for June 3 and 4 will include: * Principles of Color Technology-Color scientists Roy Berns and Mark Fairchild, MCSL director, will introduce students to basic colorimetry used in applications such as coatings, textiles, automobiles, plastics and image reproduction. Participants will learn about the derivation of the CIE system of tristimulus values, color spaces such as CIELAB and color difference equations such as CIE94 and CMC. The course will also describe instrumentation for colorimetry and the evaluation of measurement accuracy and precision. * Device Profiles for Color Management-Color scientist Mitchell Rosen will focus on techniques for incorporating device characterization into ICC-compatible device profiles. Participants will explore various profiling techniques and prepare and encode characterization data generated from various methods ranging from direct measurement to analytical modeling. Advanced and specialized classes on June 5 and 6 will include: * Vision and Psychophysics-Color scientist Ethan Montag will provide an overview of the structure, function and performance of the human visual system, and provide a detailed introduction to visual psychophysics. Understanding human vision and the psychophysical techniques used to measure human visual performance will provide significant insight into a variety of problems. Psychophysical experiments allow quantitative measurement of visual perceptions and have applications in areas such as color tolerances, image quality and algorithm evaluation. * Instrumental-Based Color Matching-Berns will show participants how instrumental-based color matching exploits colorimetry, color physics and computer science, resulting in systems that aid colorists in matching existing and new colors. Color mixing "laws"-such as Kubelka-Munk theory for complex subtractive mixing-will be used to determine colorants and their amounts in order to match a standard. This course will cover the basic concepts of color mixing for transparent and opaque materials, colorant identification, spectral matching and colorimetric matching. Through hands-on laboratories, participants will learn the importance of the colorant database and of attaining the least metameric match. * Color Appearance: CIECAM02 and Beyond-This course will cover the phenomena and techniques of color appearance modeling, which extends colorimetry to the quantitative descriptions of stimuli across large changes in viewing conditions such as illumination, background, surround and media. Fairchild will provide a detailed derivation of CIECAM02 color appearance model and guidelines for its use. CIE TC8-01 recently published the CIECAM02 as a significant improvement and simplification of CIECAM97s. * Optimization Techniques for Color Reproduction-Noboru Ohta and Rosen will introduce the use of numerical optimization for determining spectral characteristics for high-quality color imaging systems such as television, printing and photography. Optimization techniques currently employed in the industry will be explored through interactive discussions, intensive in-class programming and one homework assignment. * Halftone Theory and Practice-Jonathan Arney will teach participants about the optical and physical principles that govern tone and color reproduction in printed halftone images. The course will review strategies for designing halftone algorithms based on these optical and physical principles, as well as the characteristics of human vision. Participants will perform hands-on experiments to characterize different classes of halftones with different printing technologies. Experiments will include video-microscopic analysis of the physical and optical behavior of these halftone systems. For more information about RIT’s summer school of industrial short courses, go to www.cis.rit.edu/mcsl.