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Sun Chemical’s Tony Bean Honored by TAGA with the Michael H. Bruno Award

Press release from the issuing company

PARSIPPANY, N.J., U.S.A. – Sun Chemical’s Anthony Bean has been honored by the Technical Association of the Graphic Arts (TAGA) as a recipient of the prestigious Michael H. Bruno Award.

The Michael H. Bruno Award is one of the most distinguished awards in the graphic arts industry. Now in its 40th year, it singles out professionals with distinguished careers to receive it in appreciation for their dedicated services and contributions to the advancement of graphic arts internationally.  

Bean, a field marketing manager of energy curing at Sun Chemical, first joined the company in 1969 and has held various positions that cover all phases of the inks group at Sun Chemical, including R&D, manufacturing, technical support, sales and marketing. He holds three patents in energy curing, is the author of four published books, and the writer of many articles on ink technology and energy curing.

Bean has served on the Board of Directors for RadTech International, spoken at numerous conferences, instructed many courses for the Oil & Color Chemists Association and the National Association of Printing Ink Manufacturers (NAPIM), and has been the recipient of the NAPIM Printing Ink Pioneering Award and NAPIM Technical Achievement Award. He holds an MBA and a master’s degree in chemistry from Fairleigh Dickinson University in Rutherford, N.J. and a bachelor’s degree in chemistry from Loras College in Dubuque, Iowa. 

“What Tony has accomplished in his more than 45 years of service to Sun Chemical and the graphic arts community as a whole is exemplary. He is certainly more than deserving of this prestigious award,” said Charles Murray, President of North American Inks, Sun Chemical. “In addition to his many technical contributions, he is a pleasure to work with. We are exceptionally proud of his accomplishments.”

Bean will receive the award during the TAGA 2016 Annual Technical Conference held in Memphis, Tenn. from March 20-23, 2016.


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