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Natgraph focuses on efficiency, economy and ecology at FESPA

Press release from the issuing company

Efficiency, Economy and Ecology will be the central themes for Natgraph at next month's FESPA, as it showcases several revolutionary developments in drying/curing technology for the screenprinting industry, as well as a new stencil exposure system.

The Natgraph team will be on Stand 260 in Hall A1 in Munich, and are anticipating strong interest in their FESPA line-up which will spotlight the following advantages;
- Full electronic control for UV curing (no transformers), allowing the UV lamp power to be selected from the touch screen resulting in potentially massive operational savings
- Sheet detector systems, automatically lowering the power output of the selected UV lamps to the minimum power level when no substrate is detected
- Recipe saving of dryer settings - a feature previously only available as on option but now a  standard feature on all Natgraph dryers, allowing the settings of any job to be recalled for future use
- Refrigerated cooling of 2m UV Modules - lowering the temperature within the UV module even further allowing an optimum belt speed to be used and lower UV power settings.
- Angled Exposure Unit for conventional and CTS exposure - this type of exposure system has many advantages over conventional units, these include; fully automatic operation via PLC, touch screen control, exposure of CTS (wax or ink jet) stencils, lower glass temperature (reducing positive distortion), easy frame loading/unloading, reduced possibility of glass scratching, etc.

Commenting on Natgraph's FESPA line-up, Commercial Director, Alan Shaw, said: "The screen printing process is viable, versatile and profitable as a method of applying surface coatings, especially in industrial and special purpose, high value end-product manufacture.  Natgraph's, improvements to the efficiency of the drying process will result in a better yield, more economical operation and therefore a better ecological result. Our FESPA stand will offer great examples of what is now possible."