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Artwork Systems & Enfocus United at Graph Expo

Monday, August 28, 2006

Press release from the issuing company

Ghent, Belgium – August 25, 2006 – Artwork Systems Group N.V., a world leader in professional pre-press software; announces that it will showcase its acclaimed range of solutions together with its Enfocus Group at booth #5229, Graph Expo & Converting Expo, October 15-18, in Chicago. This is the first time the two will share an integrated exhibit in North America. Attendees at Graph Expo & Converting Expo will have the opportunity to experience interactive demonstrations of Artwork Systems' popular offerings, including: new Nexus 8.3, the latest version of the popular label and packaging workflow solution; new Odystar 2.5 for prepress workflow management; PA:CT (Packaging:Certified Technology), for secure, trackable PDF processing in packaging applications; Neo, for quick and efficient editing of native PDF files; Concentric Screening, a revolutionary new halftone dot technology; and WebWay 4.0, for Internet collaboration with remote users. Additionally, Enfocus is spotlighting its newest solutions: PitStop Professional 7, the newly enhanced version of the industry standard for PDF preflight, auto-correction and editing; PitStop Automate, providing affordable, advanced automation for consistent and reliable output; and Instant Barcode, enabling the easy creation, verification, fixing and reading of barcodes. Enfocus' proven Certified PDF technology guarantees reliable PDF creation and file exchange.




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