Ghent, Belgium - July 31, 2006 - Artwork Systems Group N.V., a world leader in professional pre-press software, announces that it will showcase its acclaimed range of solutions at key industry events in Q4 2006. Artwork Systems Vice President of Technical Marketing, Mike Rottenborn, will be a featured speaker at the September 12 Label Expo conference session, "Success with prepress - completing the digital workflow." Among the venues at which Artwork Systems will exhibit are: - Label Expo 2006, September 11-14, Chicago, booth 5213 - Graph Expo 2006, October 15-18, Chicago, booth, 5229 These events cap off an exciting and fruitful international schedule of trade shows and conferences in which Artwork Systems participated, or were featured, such as: INTERGRAPHIC (France), GRAPHITEC (France), Fugrama (Belgium), Ipex 2006 (UK), GRAFITALIA (Italy), A.Pack Austria (Austria), Fespa (The Netherlands), OnDemand (USA), Expoprint 2006 (Brazil), Printech (New Zealand), and All in Print (China). Guido Van der Schueren, Chairman of the Board, Artwork Systems, says, "The response that we've had this year at these visible international venues has been resoundingly positive. Businesses worldwide share a common interest in taking advantage of the powerful efficiencies of our workflow solutions. We are pleased to continue to deliver and showcase our solutions for the commercial printing, packaging and publishing markets." Attendees at the events will have the opportunity to experience interactive demonstrations of Artwork Systems' popular offerings, including: new Nexus 8.3, the latest version of the popular label and packaging workflow solution; new Odystar 2.5 for prepress workflow management; PA:CT (Packaging:Certified Technology), for secure, trackable PDF processing in packaging applications; Neo, for quick and efficient editing of native PDF files; Concentric Screening, a revolutionary new halftone dot technology; and WebWay 4.0, for Internet collaboration with remote users.